Eun-young Na, Dong-myong Na, and Jin-seong Park나은영, 나동명, 박진성
Research Institute of Energy Resources Technology, Chosun University, Gwangju 501-759, Korea
Department of Advanced Materials Engineering, Chosun University, Gwangju 501-759, Korea조선대학교 에너지자원신기술연구소, 조선대학교 신소재공학과
WO3 and NiO-WO3 thin films were deposited on a Si (100) substrate by using high vacuum thermal
evaporation. The effects of various film thicknesses on the surface morphology WO3 and NiO-WO3 thin films were
investigated. X-ray diffraction (XRD), Scanning e
Keyword : NiO-WO3 thin film, Thermal evaporation, WO3 thin film, Surface morphology, XPS.