Hwa-Young Lee, Kwan-Hyi Lee and Won-Young Jeung
Metals Processing Research Center, Korea Institute of Science & Technology, P. O. Box 131, Cheongryang, Seoul 130-650, Korea
An attempt was made for the application of porous reticular metal to a heat dissipation material in semiconductor
process. For this aim, the electrodeposition of Fe/Ni alloy on the porous reticular Cu has been performed
to minimize the thermal expansion m
Keyword : heat dissipation, porous reticular metal, electrodeposition, Fe/Ni layer