한국전기화학회

Vol.12, No.4, November 2009

Theoretical Analysis of Secondary Current Distributions for Electrode with a Projection Part in Electroplating System돌출부를 지닌 전극의 전기도금시스템에 대한 이론적 이차 전류분포 해석: JKES Vol.12, No.4, pp.317~323, November 2009; DOI : 10.5229/JKES.2009.12.4.317

손태원, 주재백

홍익대학교 공과대학 화학공학과Department of Chemical Engineering, Hong Ik University

Theoretical calculations for the secondary current distributions for the electrode with a projection part in electroplating were performed. Two kinds of electrodes were considered. One is a electrode with the overall conducting surfaces(Case 1) and the ot

Keyword : Electroplating model, Current distribution, Projection part, Uniformity

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JKES

Vol.12, No.4, November 2009